Today is quite productive in a way - many issues able to resolve one by one:
SPC HOLD
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Tool spc hold. MGGGW625 step back to remeasure. and 2EWB22 done ER. Uv tool down while measuring er wafer.wait for uv tool to up to measure er.
Lot step back and remeasure thickness within ctrl. No issue with uv tool when observed, compared with nanospec thkness comparable.
ER high, temp verified actual 22.5 bth edge and center. Display 22.5C. Flow rate 13Lpm vs display 15Lpm (within spec). Checked ER using wfrs frm 3 boxes, all high but from one of the box, pre thkness 900+, ER slightly on the high side, 214 but those pre thkness 1000+ or <800A, ER alr out. Alr informed optr to use thkness arnd 900+A. MS found no issue with tool, ER rcp used correct(rcp 1:45s). Also towards end bath, req to change chem, and chk ER within ctrl on high side at 211. Rls tool to monitor. 1st run thickness verified using nanospec within ctrl
ECD LOW OOC
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RTK604508 have LN oos for LM03/LM20 pt7. ~44.1 (spec: 49.5-52.5). Checked, no focus issue when measuring pt7. Lot ran in JEWB3B, partner lot is RE04423 no ecd issue.
Ave LN ooc 50.0, but still within spec. MCD54.5 on target, delta ~0.33 no drift as well. Measured the LN using QC scope for LM03/LM20 at R01C26, LN is 51.56/51.43 respectively. Stepped back lot,Also done 100% already haven't seen data yet.
Lot done 100% cd measurement. checked no focus issue. still seen 9.07 for slot 3/4/5/7/11/22/23 .this 7 wafer pt7 with -9.07.again check lm 03 and lm -4 under scope, pt 7 reading with 51.03 -51.49. Photo taken.no scratch seen on wafer surface.
From 100% data, pts 7 getting -ve value, under scope no abnorma;it with slope pattern at pt 7. Step back to remeasure, for LM3/12/20, no -ve value, also no issue with ivs focus. All data within ctrl. Photo taken of ivs measurement data. Lot moved
BS RING Probelm
Lot on hold by prev shift due to bs ring. Checked that lot was on hold for masking but disagree. Checked most severe is slot 25(#02) and slot 5(#01) but still within the 3mm width criteria. Moved. Buddy run in 3B, no on hold for bs ring. BL:126
Lots not adv hold and is under prod. At etch wet n-buried, event ASRHwB33AM
keyed and no timing shown. Prev rnd lots launched using 19mins to etch at this lvl. Need to highlight to device engr abt this issue.
