Deep shit in machine and temporary solution

The machine 01 is running into problem, so me and teammate came out a temporary solution to contain the problem.   1. Mask contact level need to run with batch by poly cells.Do sample when          change batch.                                                                   Zcell05 and Zcell18 one batch.                                                  Zcell20, ZCELL21 one batch                                                      Zcell22 one batch.                                                           2. Zcell22: Ban Gen-3 metal due to CD unstable                                  3. Zcell18: Ban Tanis poly due to Bin8,9 loss, pending further investigation.   4. Zcell23: Coater unit 3 motor faulty, no spare part, June took the motor           from developer unit 3, so by passed developer unit 3 for pg#11,12,14,15      5. ZCELL03: Developer PG#2 B/S stain unable to resolve, QV delinked               6. Zcell22: Ban dev unit 5 due blue cd variation issue.                             traced back issue from 8-Feb due to poly cd unstable.                   7. ZCELL07: TANIS SLOPE TRM BANNED due to frequent Misalignment                 8. ZCELL13: AWW SLOPE BAN DUE TO EWS BIN4 ISSUE                                    SLOPE BANNED DUE TO EWS ISSUE, CONCERN ON EBR DRIP                           9. KLSC15: TEMPORARY DELINK PRMCT-MPG2 DUE TO MS6SSMT2-1 NOT LINK TO KLMSC15   10. KLSC21: SOFTBAKE HPO UNIT 10 SUPPORT PIN BROKEN, NOE FIXED, BYPASS HPO    UNIT FOR PG$21,22,24,25.                                                    11. KLSC01: TEMPORARY BY PASS UNIT 4 DUE TO DROP WAFER AFT COATING DUE TO  ROBOT ARM ISSUE                                                                                                                                  -KLSC01 unit#4 not activated for pg#2 due to mismatch in spin speed between the unit#3 and #4. Coat pg#6 the unit#4 already activated.                  12. ZCELL04: Pre-aligner issue. Delink for all first mask except 2W9 adaptor &     3Q9 adaptor 1st mask as these are single tool. 7A9 Mask base also not   delink as some 7a base is not first mask       If the problem persist, Previously avi ooc due to LM02 stacking faults. Epi engr request 100% avi result and informed avi operator to proceed eos.Pls feedback to epi engr once scan done