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VESDA alarm activated due to burning smell and smoke from EXT resistor.We activated cleaned the holder and replaced the 3.9K Resistor.We also found Ext voltage stable only up to 55KV.
Decided to Vent the source and found Bushing heavily coated. Cleaned away and replaced the source as the Arc chamber slit too wide and suspect required more gas than normal. At last, conditioned with Argon and then released back to prod.
Batch03: SF count A side 114 cavity 14 column 7
Wait unload B side. Then do leak check A side. Was using both Black and Red H2 detector, found no leak. Check Belljar base condition- not much flakes.
Check Susceptor for spikes – none for finding.
Quartz items condition with flakes deposition. Baseplate checked- condition ok.
Engineer requested to wash quartz. Same time clean minor flakes on bell and baseplate. Then check Laminar flow-pass 0.45.
After quartz wash, put back. Redo susceptor centering. Since no dust count device, check shield door dust via wafer surfscan.
A side result -12-16. PM clean above sheild door. Then redo scan- result - 0-5. Then handover to Engineering.
Etch09: Wafer back have acid stain.
Both medium1 and 2 suction were too fast. He tries calibrate the suck back valves with regulate the top knot but med1 still. Try on regulate SV for activate both suck back valve till the suction is smooth and no have dripping of acid.
Decidd test run dummy wafer for 1 lot, ok. Encounter swivel pick chuck mark for both side. Clean proper and continue seasoning with dummy wafer till no mark see.
At last, calibrate the flow rate of medium 1 and 2 after found the medium1 adjust to max on the regulator of flow meter. Test few pcs of dummy and check the result, ok.